Surface proximity and boron concentration effects on end-of-range defect formation during nonmelt laser annealing
نویسندگان
چکیده
formation during nonmelt laser annealing J. A. Sharp, A. J. Smith, R. P. Webb, K. J. Kirkby, N. E. B. Cowern, D. Giubertoni, S. Gennaro, M. Bersani, M. A. Foad, P. F. Fazzini, and F. Cristiano Surrey Ion Beam Centre, Advanced Technology Institute, Faculty of Engineering and Physical Sciences, University of Surrey, Guildford GU2 7XH, United Kingdom School of Electrical, Electronic and Computer Engineering, University of Newcastle upon Tyne, Newcastle upon Tyne NE1 7RU, United Kingdom Fondazione Bruno Kessler, Ricerca Scientifica e Tecnologica, Via Sommarive 18, Povo (Trento) 38050, Italy Front End Products, Applied Materials Inc., 974 E. Arques Avenue, Sunnyvale, California 94086, USA CEMES-CNRS, University of Toulouse, 29, rue Jeanne Marvig, 31055 Toulouse, France LAAS-CNRS, University of Toulouse, 7 av. Du Col. Roche, 31077 Toulouse, France
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تاریخ انتشار 2008